The International Society for Optics and Photonics
CREOL, The College of Optics & Photonics
The mission of SPIE Student Chapter is to advance an interdisciplinary approach to the science and application of light and provide professional development opportunities for UCF students.

SPIE Student Chapter Seminar: "The End of the Semiconductor Industry as We Know It” by Dr. Chris A. Mack


 Dr. Chris A. Mack

Celebrating the International Year of Light 2015

 Abstract: Continued migration down the path predicted by Moore's Law must eventual come to an end. The goal of this presentation is to discuss the technical and economic drivers of Moore's Law, with special emphasis on their interdependence. These drivers can be classified as "push" (technology improvements push us down the Moore's Law path) and "pull" (the economic incentives create increasing chip production volumes which drive the technology learning curve). In fact, Moore's Law can be considered as an instance of general learning curve theory, which places a special importance on the role of increasing chip volumes on the slope of Moore's Law. After a general discussion of the macro-trends of the semiconductor industry, developments in optical lithography are described in relation to the growth of the semiconductor industry. The economics of the semiconductor industry, and thus optical lithography, is discussed and its impact on technology development explained. When, if ever, will optical lithography be supplanted by the next leap in lithography technology? What are the economic impacts of the end of Moore's Law? When will the author's career come to a crashing halt? All of these questions and more will be answered.

Biography: Chris A. Mack received Bachelor of Science degrees in physics, chemistry, electrical engineering, and chemical engineering from Rose-Hulman Institute of Technology in 1982, a Master of Science degree in electrical engineering from the University of Maryland in 1989, and a Ph.D. in chemical engineering from the University of Texas at Austin in 1998.  Mr. Mack founded FINLE Technologies, the developer of the lithography simulation software PROLITH, in 1990, serving as President and Chief Technical Officer until the acquisition of FINLE by KLA-Tencor in 2000.  For the next five years he served as Vice President of Lithography Technology for KLA-Tencor.  In 2003 he received the SEMI Award for North America for his efforts in lithography simulation and education.  He became a fellow of SPIE in 2006, and a fellow of IEEE in 2010.  In 2009 he received the SPIE Frits Zernike Award for Microlithography.  He is also an adjunct faculty member at the University of Texas at Austin and spent the Fall 2006 semester as a visiting professor at the University of Notre Dame.  He has recently completed a comprehensive graduate-level textbook on optical lithography, Fundamental Principles of Optical Lithography, published in late 2007.  In 2012 he became Editor-In-Chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3).  Currently, he writes, teaches, and consults on the field of semiconductor microlithography in Austin, Texas.  (

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Alex Sincore




Posted Monday, November 9, 2015

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